发明名称 |
COOLING SHIELD FOR SUBSTRATE PROCESSING CHAMBER |
摘要 |
A process kit comprises an upper shield to encircle a sputtering target in a substrate processing chamber, to reduce deposition of process deposits on the chamber components and the overhanging edge of the substrate. The shield described is of unitary construction with a top ring, support ledge and cylindrical band having a plurality of steps.
|
申请公布号 |
KR20100017278(A) |
申请公布日期 |
2010.02.16 |
申请号 |
KR20097024377 |
申请日期 |
2008.04.22 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
PAVLOFF CRISTOPHER MARK;SCHEIBLE KATHLEEN |
分类号 |
C23C14/34;H01J37/34;H01L21/203 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|