发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR CRYSTAL OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, SEMICONDUCTOR SUBSTRATE FORMED OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, AND SEMICONDUCTOR LIGHT EMISSION DEVICE |
摘要 |
<p>A method for manufacturing a semiconductor crystal of a nitride of an element belonging to Group-III includes a growth step which prepares a seed crystal having a non-polar surface and causes a semiconductor of a nitride of an element belonging to Group-III to grow from the non-polar surface in a gas phase. The growth step causes the semiconductor of the nitride of the element belonging to Group-III to grow so as to extend in the +C-axis direction of the seed crystal. Thus, it is possible to obtain a semiconductor crystal of a nitride of an element belonging to Group-III-V having a non-polar surface of a high quality and a large area.</p> |
申请公布号 |
KR20100017798(A) |
申请公布日期 |
2010.02.16 |
申请号 |
KR20097026018 |
申请日期 |
2008.05.16 |
申请人 |
MITSUBISHI CHEMICAL CORPORATION |
发明人 |
FUJITO KENJI;KIYOMI KAZUMASA |
分类号 |
C30B25/20;C30B29/38;H01L33/16;H01L33/32 |
主分类号 |
C30B25/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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