发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR CRYSTAL OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, SEMICONDUCTOR SUBSTRATE FORMED OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, AND SEMICONDUCTOR LIGHT EMISSION DEVICE
摘要 <p>A method for manufacturing a semiconductor crystal of a nitride of an element belonging to Group-III includes a growth step which prepares a seed crystal having a non-polar surface and causes a semiconductor of a nitride of an element belonging to Group-III to grow from the non-polar surface in a gas phase. The growth step causes the semiconductor of the nitride of the element belonging to Group-III to grow so as to extend in the +C-axis direction of the seed crystal. Thus, it is possible to obtain a semiconductor crystal of a nitride of an element belonging to Group-III-V having a non-polar surface of a high quality and a large area.</p>
申请公布号 KR20100017798(A) 申请公布日期 2010.02.16
申请号 KR20097026018 申请日期 2008.05.16
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 FUJITO KENJI;KIYOMI KAZUMASA
分类号 C30B25/20;C30B29/38;H01L33/16;H01L33/32 主分类号 C30B25/20
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