发明名称 Semiconductor device with a diffusion barrier film having a spacing for stress relief of solder bump
摘要 The present invention provides a semiconductor device exhibiting an improved reliability. A semiconductor device comprises a semiconductor chip having an electrode on a surface thereof and a mounting substrate, and the electrode (aluminum electrode) of the semiconductor chip is coupled to the mounting substrate through a bump (solder bump 104). A plurality of diffusion barrier films (UBM 112) for preventing a diffusion of a material composing the bump is provided between the electrode and the bump, and the diffusion barrier film is formed to have a plurality of divided portions via spacings therebetween.
申请公布号 US7663201(B2) 申请公布日期 2010.02.16
申请号 US20060447966 申请日期 2006.06.07
申请人 NEC ELECTRONICS CORPORATION 发明人 YAMADA YUKIKO
分类号 H01L21/44;H01L21/4763;H01L29/40 主分类号 H01L21/44
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