发明名称 Thin film transistor array panel and method of manufacturing the same
摘要 A plurality of gate lines having gate electrodes are formed on a substrate and a semiconductor layer is formed on a gate insulating layer covering the gate lines. A plurality of data lines intersecting the gate lines are formed on the gate insulating layer and a plurality of drain electrodes are formed extending parallel with and adjacent to the data lines. Furthermore, a plurality of storage capacitor conductors are formed to be connected to the drain electrodes and to overlap an adjacent gate line. A passivation layer made of an organic material is formed on the above structure and has a contact hole. Furthermore, a plurality of pixel electrodes are formed to be electrically connected to the drain electrodes through the contact hole.
申请公布号 US7662651(B2) 申请公布日期 2010.02.16
申请号 US20070695937 申请日期 2007.04.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM KYUNG-WOOK;YOUN JOO-AE;LEE SEONG-YEONG
分类号 G02F1/1368;H01L21/00;G02F1/136;H01L21/336;H01L21/77;H01L21/84;H01L27/02;H01L27/12;H01L29/04;H01L29/786 主分类号 G02F1/1368
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