发明名称 Inspection apparatus and method
摘要 There are provided an inspection apparatus and method that can locally perform sample temperature regulation, so that the sample drift can be suppressed. There are included a sample stage 109 that holds a semiconductor sample 118, multiple probes 106 used to measure electrical characteristics of a semiconductor device on the semiconductor sample 118, a power source that applies voltage and/or current to the probe 106, a detector that measures electrical characteristics of the semiconductor device on the sample with which the probe is brought into contact, and an electromagnetic wave irradiating mechanism that irradiates electromagnetic wave on a measurement section of the semiconductor sample 118.
申请公布号 US7663390(B2) 申请公布日期 2010.02.16
申请号 US20080146029 申请日期 2008.06.25
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SUNAOSHI TAKESHI;KUROSAWA KOUICHI;SATO TAKESHI;KOMORI MASAAKI
分类号 G01R31/02 主分类号 G01R31/02
代理机构 代理人
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