发明名称 DIELECTRIC STRUCTURE, REACTOR USING THE SAME AND METHOD OF MANUFACTURING DIELECTRIC STRUCTURE
摘要 <P>PROBLEM TO BE SOLVED: To provide a dielectric structure capable of easily controlling a discharge state of plasma. <P>SOLUTION: The dielectric structure (1) includes a plurality of unidirectionally arranged dielectrics (3) and the electrodes (6) comprising a plurality of conductor layers (7) provided in the dielectrics (3). Plasma can be produced in between the dielectrics (3) by applying voltage across the electrodes (6). In at least one of the dielectrics (3), the electrodes (6) comprise first conductor layers (7a) having at least one of through-holes and notched parts (9) and second conductor layers (7b) provided at the positions corresponding to at least one of the through-holes and the notched parts (9) and electrically connected to the first conductor layers (7a). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010029795(A) 申请公布日期 2010.02.12
申请号 JP20080195246 申请日期 2008.07.29
申请人 KYOCERA CORP 发明人 MAKINO HIROSHI
分类号 B01J19/08;F01N3/08;H05H1/24 主分类号 B01J19/08
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