发明名称 MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of electrooptical device capable of enhancing a mechanical strength and reducing unevenness of gaps between substrates caused when an environmental temperature is changed, for example, without complicating manufacturing processes. Ž<P>SOLUTION: A light-shielding part 210 has the same size as a spacer 151 as plain view. A transluent part 220 is formed in a frame shape surrounding the light-shielding part 210 via edges 211 of the light-shielding part 210 and has an optical transmittance higher than that of the light-shielding part 210. Therefore, the irradiation of a photosensitive base film 43 with UV light due to refraction through the mask can be reduced as compared with the irradiation of the photosensitive base film 43 with UV light via the mask having no transluent part 220, that is, the mask configured only by the light-shielding part 210. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010032847(A) 申请公布日期 2010.02.12
申请号 JP20080195864 申请日期 2008.07.30
申请人 SEIKO EPSON CORP 发明人 SERA HIROSHI
分类号 G02F1/1368;G02F1/1339 主分类号 G02F1/1368
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