| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve characteristic deterioration, due to resolution deterioration accompanying restriction and thinning of the thickness of respective color filter parts, regarding color filter layer of a solid-state imaging device. Ž<P>SOLUTION: The solid-state imaging device 10 is provided with a plurality of photoelectric conversion elements 13, arranged on a semiconductor substrate 11 into a matrix form; wall parts 21, installed above regions sandwiched between the plurality of photoelectric conversion elements 13; and color filter parts 22G, 22B and 22R, arranged above the photoelectric conversion elements 13 so as to embed respective opening part surrounded by the wall parts 21. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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