| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus etc., capable of extending an exchange cycle of a processing liquid, of preventing a substrate processing efficiency from lowering, and of reducing a cost of substrate processing. Ž<P>SOLUTION: A substrate processing apparatus 1 includes: a first processing fluid circulation system 20 for circulating a processing fluid between a tank 11 and a substrate processing mechanism 12; two adsorption towers 32, 33 for adsorbing metal ions which are contained in the processing fluid by processing substrates in the substrate processing mechanism 12; a second processing fluid circulation mechanism 34 which circulates the processing fluid in the tank 11 by supplying it selectively to either of the adsorption towers 32, 33; and a controller 28 which controls the operation of the second fluid circulation mechanism 34 so as to alternately switch the adsorption towers 32, 33 at predetermined time intervals. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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