发明名称 CIRCUIT PATTERN EXAMINING APPARATUS AND CIRCUIT PATTERN EXAMINING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inspection technology, capable of determining a defect with high sensitivity up to the most peripheral part of a memory mat part of a semiconductor device or up to a peripheral circuit that has no repeatability. SOLUTION: The device includes an image detection part for acquiring an image of a circuit pattern, constituted of a plurality of dies having a repeated pattern; a defect determining part for synthesizing a reference image, by switching an addition object corresponding to a domain of the repeated pattern and other regions relative to the acquired detection image, comparing it with a detection image, and detecting defects; and a display device for displaying an image of the detected defect. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010032403(A) 申请公布日期 2010.02.12
申请号 JP20080195606 申请日期 2008.07.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HIROI TAKASHI;YOSHIDA TAKEYUKI;HOSOYA NAOKI;HONDA TOSHIFUMI
分类号 G01N21/956;G01N23/225;G06T1/00;H01L21/66 主分类号 G01N21/956
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