发明名称 MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of electrooptical device capable of incorporating a wire grid having a uniform optical characteristic into a liquid crystal device without complicating manufacturing processes as much as possible. <P>SOLUTION: A photosensitive material having a nega-type photosensitive characteristic is applied on a plurality of metallic protrusion parts 201 and, thereby, a photosensitive film 203a with which the plurality of metallic protrusion parts 201 are covered and hollow parts 202 are filled-in is formed. Subsequently, a surface part 203c occupying a part from the surface of the photosensitive film 203a to the upper surface of the metallic protrusion parts 201, in the photosensitive film 203a is exposed to light. Thereby, the surface part 203c in the uncured photosensitive film 203c is exposed to light and the exposed surface part 203c is cured. Subsequently, an uncured filled part 203b in the photosensitive film 203a with which the hollow parts 202 are filled-in, therefore, being not exposed to light in the preceding step is dissolved into dissolving liquid and, thereby, the filled part 203b is removed. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010032849(A) 申请公布日期 2010.02.12
申请号 JP20080195866 申请日期 2008.07.30
申请人 SEIKO EPSON CORP 发明人 SERA HIROSHI
分类号 G02F1/1335;G02B5/30 主分类号 G02F1/1335
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