| 摘要 |
Provided is a method for manufacturing surface unevenness, by which a desired uneven shape can be formed easily at a high accuracy by using a photomask. On one side of a photosensitive film (10) composed of a photosensitive resin composite, a mask member (20) having a light permeable section and a non light permeable section is arranged at an interval from the photosensitive film (10), and a light diffusing member (30) is arranged on the side opposite to the photosensitive film (10) of the mask member (20). Light is applied from a light source arranged on the side opposite to the mask member (20) of the light diffusing member (30), and a photosensitive film (10) is exposed through the light diffusing member (30) and the light permeable section of the mask member (20). An exposed section or unexposed section of the photosensitive film (10) is removed by development, and unevenness determined by the shape of the exposed section or the unexposed section is formed on the photosensitive film (10). In the exposure, exposure conditions such as haze of the light diffusing member (30) are controlled, and the shape of the exposed section or the unexposed section is controlled. |
