发明名称 HYDROSILYLATED REACTION PRODUCT AND METHOD FOR PRODUCING THE SAME, TRANSFER MATERIAL CURABLE COMPOSITION CONTAINING THE SAME, AND PRODUCTION METHOD OF TRANSFER LAYER USING THE SAME OR TRANSFER MATERIAL CURABLE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a hydrosilylated reaction product which is applicable to a nanoimprint method for forming a minute pattern with high throughput and having high etching rate selectivity between fluorine gas and oxygen gas, or a transfer material curable composition containing the same, and to provide a hydrosilylated reaction product which can suppress transfer of minute unevenness and minute irregularities except a pattern of an injection-molded resin stamper and a film stamper used for nanoimprinting or a transfer material curable composition containing the same. <P>SOLUTION: The hydrosilylated reaction product is obtained by mutually reacting a specific cage silsesquioxane compound (A) having an Si-H bond-containing group, a compound (B) having a curable functional group and a carbon-carbon unsaturated bond-containing group except the curable functional group, and a specific cage silsesquioxane compound (C) having a carbon-carbon unsaturated bond-containing group. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010031254(A) 申请公布日期 2010.02.12
申请号 JP20090147800 申请日期 2009.06.22
申请人 SHOWA DENKO KK 发明人 ARAI YOSHIKAZU;UCHIDA HIROSHI
分类号 C08G77/50;C08F299/08;C08G59/20;C08G59/42;C08G75/04;C08G77/12;C08G77/20;C08L83/05;C08L83/07 主分类号 C08G77/50
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