发明名称 |
HYDROSILYLATED REACTION PRODUCT AND METHOD FOR PRODUCING THE SAME, TRANSFER MATERIAL CURABLE COMPOSITION CONTAINING THE SAME, AND PRODUCTION METHOD OF TRANSFER LAYER USING THE SAME OR TRANSFER MATERIAL CURABLE COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a hydrosilylated reaction product which is applicable to a nanoimprint method for forming a minute pattern with high throughput and having high etching rate selectivity between fluorine gas and oxygen gas, or a transfer material curable composition containing the same, and to provide a hydrosilylated reaction product which can suppress transfer of minute unevenness and minute irregularities except a pattern of an injection-molded resin stamper and a film stamper used for nanoimprinting or a transfer material curable composition containing the same. <P>SOLUTION: The hydrosilylated reaction product is obtained by mutually reacting a specific cage silsesquioxane compound (A) having an Si-H bond-containing group, a compound (B) having a curable functional group and a carbon-carbon unsaturated bond-containing group except the curable functional group, and a specific cage silsesquioxane compound (C) having a carbon-carbon unsaturated bond-containing group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010031254(A) |
申请公布日期 |
2010.02.12 |
申请号 |
JP20090147800 |
申请日期 |
2009.06.22 |
申请人 |
SHOWA DENKO KK |
发明人 |
ARAI YOSHIKAZU;UCHIDA HIROSHI |
分类号 |
C08G77/50;C08F299/08;C08G59/20;C08G59/42;C08G75/04;C08G77/12;C08G77/20;C08L83/05;C08L83/07 |
主分类号 |
C08G77/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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