发明名称 |
METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM ELECTRODE ASSEMBLIES |
摘要 |
Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned. |
申请公布号 |
KR20100016006(A) |
申请公布日期 |
2010.02.12 |
申请号 |
KR20097022560 |
申请日期 |
2008.03.27 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
SHIH HONG;YIN YAOBO;WU SHUN JACKSON;AVOYAN ARMEN;DAUGHERTY JOHN E.;JIANG LINDA |
分类号 |
H01L21/3065;H01L21/302 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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