发明名称 METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM ELECTRODE ASSEMBLIES
摘要 Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.
申请公布号 KR20100016006(A) 申请公布日期 2010.02.12
申请号 KR20097022560 申请日期 2008.03.27
申请人 LAM RESEARCH CORPORATION 发明人 SHIH HONG;YIN YAOBO;WU SHUN JACKSON;AVOYAN ARMEN;DAUGHERTY JOHN E.;JIANG LINDA
分类号 H01L21/3065;H01L21/302 主分类号 H01L21/3065
代理机构 代理人
主权项
地址