| 摘要 |
Disclosed is a photosensitive composition which enables to form a partition wall (a black matrix) excellent in light shielding property and liquid repellency. Specifically disclosed is a photosensitive composition containing a polymer (A) having, in a molecule, a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond, a black coloring agent (B), a photopolymerization initiator (C) composed of an O-acyloxime compound, and a photosensitive resin (D) having an acidic group and an ethylenic double bond in a molecule. This photosensitive composition is characterized in that the ratio of the black coloring agent (B) to the total solid content of the composition is within the range of 15-60% by mass.
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