发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device which is reduced in occupation area. <P>SOLUTION: The nonvolatile semiconductor memory device includes: a memory cell array layer 400 having electrically rewritable memory cells MC connected in series; a control circuit layer 200 disposed below the memory cell array layer 400 and controlling a voltage applied to the memory cells MC; and an interconnection portion 500 electrically connecting the control circuit layer 200 and the memory cell array layer 400. The memory cell array layer 400 includes: first memory cell regions 40A having the memory cells; and connection regions 40C provided with the interconnection portion 500. The first memory cell regions 40A are provided repeatedly at a first pitch in a row direction. The connection regions 40C are provided intermittently between the first memory cell regions 40A mutually adjacent in the row direction, and at a second pitch in a column direction. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010034109(A) 申请公布日期 2010.02.12
申请号 JP20080191762 申请日期 2008.07.25
申请人 TOSHIBA CORP 发明人 KAMIGAICHI TAKESHI;ARAI FUMITAKA
分类号 H01L21/8247;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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