发明名称 METHOD OF ESTIMATING PATTERN FORM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of estimating a pattern form where roughness inside a substrate surface thereof is estimated in a short period of time and with a high degree of accuracy. <P>SOLUTION: The method of estimating the pattern form includes the steps of carrying out simulation-estimation of the intensity distribution of a pattern image with respect to the pattern form on the substrate which is formed based on the pattern data, calculating a pattern edge position corresponding to the pattern data based on the intensity distribution of the pattern image, calculating characteristics number with respect to the intensity distribution of the pattern image at the pattern edge position based on the pattern edge position, and calculating an amount of variations of the pattern edge position by using a correlation between the characteristics number and the amount of variations of the pattern edge position. Further, the method includes the step of estimating the pattern edge position to be evaluated by taking the amount of the variations to the pattern edge position into consideration. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010034402(A) 申请公布日期 2010.02.12
申请号 JP20080196428 申请日期 2008.07.30
申请人 TOSHIBA CORP 发明人 UNO TAIGA;KOTANI TOSHIYA
分类号 H01L21/027;G03F1/36;G03F1/68;G03F1/70 主分类号 H01L21/027
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