| 摘要 |
1,208,923. Photo-electric fluorescence analysis. COMMISSARIAT A L'ENERGIE ATOMIQUE. May 8, 1968 [May 8, 1967], No.21858/68. Heading G1A. [Also in Division H5] An apparatus for the X-ray examination of a series of specimens 8 comprises a conveyer, e.g. chain 16, to which the specimens are attached, a source of X-rays 4 for irradiating a specimen when in the analysis position with a beam incident at 45 degrees to the surface of the specimen, means for detecting the beam of radiation 6 emitted by the specimen when subject to such irradiation the means comprising an analyzing crystal 10 and means for detecting and measuring the radiation diffracted by the crystal, e.g. detector 12 and counting facility 34, a motor 18 for driving conveyer 16 a first sensing means for detecting the arrival of specimen 8 in the analysis position and for stopping the motor 18, means for orientating the detector 12 in one of a plurality of positions relative to the sample, a second sensing means for detecting the arrival of the detector 12 in said one relative position and control means e.g. 24 responsive to the stopping of the driving and the orientating means to initiate the operation of the detecting means and for reenergizing the orientating means. Preferably the control means 24 is also responsive to the completion of a measuring operation so as to reenergize the motion of the motor 18 and introduce the next sample. The motor 18 may be electrically energized and the first sensing means may comprise a light source 46 and a photo-diode 50 which control the operation of a relay 22 in the motor circuit, the beam of light being directed so as to be interrupted in its path to the diode by the positioning of a fresh sample at the analysis position. The orientating means may comprise an electrically energized motor and a second sensing means comprising light source 52 and diode 54 which controls a relay 62 arranged to interrupt the circuit of the motor 26 via control unit 24, the beam from the source 52 being cut off from the diode by masks 56, 58 which are in particular orientations with respect the analyzing crystal and the detector. |
