| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate inspection device 100 for a mask capable of inspecting the foreign matter on the front and back of a substrate for the mask such as a reticle used when a circuit pattern is exposed to a semiconductor wafer by a simple and inexpensive constitution. <P>SOLUTION: A support substrate 4 is attached to a stage 3 relatively movable with respect to the inspection optical mechanism 101 in a posture adjustable manner and a substrate holder 5 for holding the substrate W for the mask in a rotatable manner is supported by the support substrate 4. Then, an inspection angle position holding mechanism 9, which holds the angle-of-rotation position of the substrate holder 5 at a front inspection angle position P where the front is irradiated with inspection light and a back inspection angle position Q where the back is irradiated with the inspection light is provided, and a parallelism adjusting mechanism 8 capable of adjusting the posture to the support substrate 4 of the substrate holder 5 so that the front and back of the reticle W held to the substrate holder 5 may become parallel to the rotary axis line C of the substrate holder 5 is provided. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
