| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve the uniformity of substrate processing intra substrate surface and inter substrates. <P>SOLUTION: The substrate processing apparatus includes a substrate holder for holding a plurality of substrates in a stack in a horizontal posture, an inner tube for housing the substrate holder, an outer tube enclosing the inner tube, a gas nozzle disposed in the inner tube, a gas port bored in the gas nozzle, a material gas supply unit for supplying a material gas into the inner tube through the gas nozzle, a gas exhaust port bored in a sidewall of the inner tube, an exhaust unit which exhausts the space enclosed with the outer tube and inner tube to generate a gas flow from the gas port to the gas exhaust port in the inner tube, and a gas entry suppressing cylinder which encloses an outer periphery of an area below the area of the substrate holer where the substrates are stacked. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
