| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of maintaining a film retention rate of a resist film after development to an appropriate range. <P>SOLUTION: The resist composition contains: a resin (A) which becomes alkali-soluble by the action of an acid and which includes a structural unit having an acid-labile group in a side chain and a structural unit represented by formula (I) (where in formula (I), R<SP>1</SP>represents a hydrogen atom or a methyl group, ring X represents an unsubstituted or substituted cyclic hydrocarbon group having 3 to 30 carbon atoms and including an ester bond in the cyclic structure, and k represents an integer of 1 to 4); a resin (B) including a di-2-hydroxy-hexafluoroisopropyl-cyclohexyl group in a side chain; and an acid generator. <P>COPYRIGHT: (C)2010,JPO&INPIT |
