| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition that find applications in formation of microscopic patterns for semiconductor production and that is superior to conventional products in exposure latitude, LWR (line width roughness) and pattern collapse performance. <P>SOLUTION: The photosensitive composition comprise (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups that are different from each other in the acid decomposition ratio at an image formation sensitivity. <P>COPYRIGHT: (C)2010,JPO&INPIT |
