| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce variation of overlay accuracy due to variation of thickness of a substrate. <P>SOLUTION: Reference marks include a plurality of reference marks arranged at different positions in a second direction orthogonal to an optical axis direction and a first direction, and in the optical axis direction. A control means moves a stage in the optical axis direction and the second direction while keeping a rotational angle constant in accordance with a measurement value of a first interferometer, causes a first measurement means to measure the respective positions of the plurality of reference marks, moves the stage in the optical axis direction and the second direction while keeping the rotational angle constant in accordance with a measurement value of a second interferometer to cause a second measurement means to measure the respective positions of the plurality of reference marks, and calculates an amount for correcting the position of the stage in a plane in accordance with the position of the stage in the optical direction based on the respective positions of the plurality of reference marks measured by the first measurement means and those measured by the second measurement means. <P>COPYRIGHT: (C)2010,JPO&INPIT |
