| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust controller which can prevent reduction in exhaust efficiency, as well as, prevent penetration of particles which have recoiled from an exhaust pump into a processing chamber. <P>SOLUTION: An APC valve 17, arranged between a chamber 11 for applying an RIE processing to a wafer W and a TMP 18 having rotating vanes 46, which rotates at a high speed, is equipped with a disc-like valve body 40 which can protrude into an exhaustion passage. The valve body 40 has a through-hole 43, which penetrates the exhaust passage along an exhaust flow, and a particle trap 48 which covers the through-hole 43 at the TMP 18 side. The particle trap 48 includes a plurality of preventing members 50a-50h so arranged as to block the way of rebounded particles from the TMP 18, and the particle trap 48 has an aperture ratio of 90% or above, with respect to the exhaust flow. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
