| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and a method for cleaning a semiconductor manufacturing device capable of efficiently carrying out cleaning work as compared with a conventional one, and providing a high cleaning effect. Ž<P>SOLUTION: This device 100 for cleaning a semiconductor manufacturing device includes: a pure-water steam production vessel 2 for producing pure-water steam from pure water; a supply port 5 for supplying the pure-water steam to a cleaning object part; a supply line 4 connecting the pure-water steam production vessel to the supply port; a recovery port 6 for recovering used steam used for cleaning from the cleaning object part; a recovery vessel 8 for condensing and recovering the used steam; and a recovery line 7 connecting the recovery port 6 to the recovery vessel 8. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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