| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate transport apparatus with a substrate holding mechanism that can follow fluctuation in a vertical position caused by air surfacing without adjusting parallelism in a highly precise manner for installation so that distortion caused by a gradient between the substrate holding mechanism and the substrate may be not generated. Ž<P>SOLUTION: The substrate transport apparatus is characterized by comprising a substrate holding mechanism and a substrate holding mechanism moving mechanism that can transport the substrate holding mechanism in the direction of transport. The substrate holding mechanism is composed of a plurality of substrate clipping sections, and each substrate clipping section can follow the vertical movement of the substrate independently. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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