发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes: a first semiconductor region of a first conductivity type disposed on the side of a first electrode; and a second semiconductor region having first pillar regions of the first conductivity type and second pillar regions of a second conductivity type, the first pillar regions and the second pillar regions being provided in paired state and alternately, in a device portion and a terminal portion surrounding the device portion, along a surface on the side of a second electrode disposed on the opposite side of the first semiconductor region from the first electrode. The semiconductor device further includes a lateral RESURF (reduced surface field) region of the second conductivity type disposed at a surface portion, on the opposite side from the first semiconductor region, of the second semiconductor region in the terminal portion.
申请公布号 US2010032791(A1) 申请公布日期 2010.02.11
申请号 US20090498674 申请日期 2009.07.07
申请人 SONY CORPORATION 发明人 HOZUMI HIROKI;SASAKI YUJI;SHUSAKU YANAGAWA
分类号 H01L29/66;H01L21/20;H01L21/768 主分类号 H01L29/66
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