Composition of passivation and sputtering target and passivation membrane and manufacturing method of it,申请号KR20080039010-传众专利搜索

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发明名称	Composition of passivation and sputtering target and passivation membrane and manufacturing method of it
摘要
申请公布号	KR100941877(B1)	申请公布日期	2010.02.11
申请号	KR20080039010	申请日期	2008.04.25
申请人		发明人
分类号	C03C17/34;C03C17/40;C04B35/14;C04B35/453	主分类号	C03C17/34
代理机构		代理人
主权项
地址

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