发明名称 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
摘要 The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or -(CH2)k-CO-X4-, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
申请公布号 US2010035180(A1) 申请公布日期 2010.02.11
申请号 US20090536239 申请日期 2009.08.05
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 SHIMADA MASAHIKO;HASHIMOTO KAZUHIKO;YAMAGUCHI SATOSHI;KIM SOON SHIN;TAKATA YOSHIYUKI;HIRAOKA TAKASHI
分类号 G03F7/004 主分类号 G03F7/004
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