发明名称 CIRCUIT STRUCTURES AND METHODS WITH BEOL LAYERS CONFIGURED TO BLOCK ELECTROMAGNETIC EDGE INTERFERENCE
摘要 Back-end-of-line (BEOL) circuit structures and methods are provided for blocking externally-originating or internally-originating electromagnetic edge interference. One such BEOL circuit structure includes a semiconductor substrate supporting one or more integrated circuits, and multiple BEOL layers disposed over the semiconductor substrate. The multiple BEOL layers extend to an edge of the circuit structure and include at least one vertically-extending conductive pattern disposed adjacent to the edge of the circuit structure. The vertically-extending conductive pattern is defined, at least partially, by a plurality of elements disposed in the multiple BEOL layers. The plurality of elements are uniformly arrayed at the edge of the circuit structure in a first direction or a second direction throughout at least a portion thereof. The plurality of elements are sized and positioned in the first direction or the second direction to block electromagnetic interference of a particular wavelength from passing therethrough.
申请公布号 US2010032814(A1) 申请公布日期 2010.02.11
申请号 US20080188243 申请日期 2008.08.08
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHO CHOONGYEUN;KIM DAEIK;KIM JONGHAE;KIM MOON JU;MOULIC JAMES RANDAL
分类号 H01L23/552;H01L21/4763 主分类号 H01L23/552
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