发明名称 METHOD FOR MANUFACTURING FLEXIBLE SEMICONDUCTOR DEVICE
摘要 <p>Provided is a method for manufacturing a flexible semiconductor device.  The manufacturing method is characterized by comprising (i) a step of forming an insulating film on the upper surface of a resin film, (ii) a step of forming an extraction electrode pattern on the upper surface of the resin film, (iii) a step of forming a semiconductor layer on the insulating film in such a manner that the semiconductor layer is in contact with the extraction electrode pattern, and (iv) a step of forming a sealing resin layer on the upper surface of the resin film in such a manner that the sealing resin layer covers the semiconductor layer and the extraction electrode pattern, wherein at least one forming step among the above (i) to (iv) is performed by a printing method.  In the manufacturing method, various layers can be formed by a simple printing process without using a vacuum process, photolithography, or the like.</p>
申请公布号 WO2010016206(A1) 申请公布日期 2010.02.11
申请号 WO2009JP03615 申请日期 2009.07.30
申请人 PANASONIC CORPORATION;HIRANO, KOICHI;NAKATANI, SEIICHI;OGAWA, TATSUO 发明人 HIRANO, KOICHI;NAKATANI, SEIICHI;OGAWA, TATSUO
分类号 H01L29/786;H01L21/336;H01L51/05 主分类号 H01L29/786
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