| 摘要 |
<p>The invention is generally related to process for generating one or more molecules having the formula SixHy, where x and y are integers =1, such as silane, comprising the steps of: providing a silicon containing material, wherein the silicon containing material includes at least 20 weight percent silicon atoms based on the total weight of the silicon containing material; generating a plasma capable of vaporizing a silicon atom, sputtering a silicon atom, or both using a plasma generating device; and contacting the plasma to the silicon containing material in a chamber having an atmosphere that includes at least about 0.5 mole percent hydrogen atoms based on the total moles of atoms in the atmosphere; so that a molecule having the formula SixHy; (e.g., silane) is generated. The process preferably includes a step of removing one or more impurities from the SixHy (e.g., the silane) to form a clean SixHy (e.g., silane). The process may also include a step of reacting the SixHy (e.g., the silane) to produce a high purity silicon containing material such as electronic grade metallic silicon, photovoltaic grade metallic silicon, or both.</p> |
