| 摘要 |
A resin composition that irrespective of the condition of surface of substrate, attains micronizing of pattern interstices of a resist pattern effectively with high precision and also attains forming of a pattern exceeding wavelength limit in an appropriate economically efficient manner at low cost in the state of less pattern defect, and that realizes an enhancement of pattern shrinkage ratio; and a method of micropattern formation in which a microscopic resist pattern can be efficiently formed by the use of the resin composition. The resin composition for micropattern formation is one comprising a hydroxylated resin, a crosslinking component and an alcoholic solvent containing an alcohol and, based on the whole solvent, 10 mass% or less of water, wherein a compound having two or more acryloyloxy groups in each molecule thereof is contained as the crosslinking component.
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