| 摘要 |
The GaN-based semiconductor element 20 of the present invention comprises the buffer layer 2 formed on the sapphire (0001) substrate 1, the channel layer 3 comprised of the undoped GaN layer, and the electron supply layer 4 comprised of the undoped AlGaN layer. The buffer layer 2 is comprised of the n-GaN layer having n-type conductivity. The configuration is adopted as the structure to be able to control the electric potential of the buffer layer 2, wherein the source electrode 6 is implanted into the epitaxial layer (the channel layer 3 and the electron supply layer 4) to be formed on the buffer layer 2, and it is extended to the depth reaching the buffer layer 2 for ohmic contacting to the buffer layer 2. It is able to fix the electric potential of the buffer layer 2 comprised of the n-GaN layer for being equal to that of the source electrode 6 because the source electrode 6 is ohmic contacted to the buffer layer 2.
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