发明名称 PASSIVATION LAYER FOR A CIRCUIT DEVICE AND METHOD OF MANUFACTURE
摘要 <p>According to one embodiment of the disclosure, a method for passivating a circuit device generally includes providing a substrate having a substrate surface, forming an electrical component on the substrate surface, and coating the substrate surface and the electrical component with a first protective dielectric layer. The first protective dielectric layer is made of a generally moisture insoluble material having a moisture permeability less than 0.01 gram/meter/day, a moisture absorption less than 0.04 percent, a dielectric constant less than 10, a dielectric loss less than 0.005, a breakdown voltage strength greater than 8 million volts/centimeter, a sheet resistivity greater than 1015 ohm-centimeter, and a defect density less than 0.5/centimeter.</p>
申请公布号 KR20100014937(A) 申请公布日期 2010.02.11
申请号 KR20097018694 申请日期 2008.01.24
申请人 RAYTHEON COMPANY 发明人 BEDINGER JOHN M.;MOORE MICHAEL A.;HALLOCK ROBERT B.;TABATABAIE ALAVI KAMAL;KAZIOR THOMAS E.
分类号 C08G59/56;H01L21/768;H01L23/31;H01L23/482 主分类号 C08G59/56
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