| 摘要 |
PURPOSE: A shower head device of process chamber for manufacturing a semiconductor is provided to reduce manufacturing costs and work time by installing a height adjusting part in the bottom of a heater block to control the height of the heater block from the outside. CONSTITUTION: A process of manufacturing semiconductor is performed in a process chamber(100). A shower head(120) has a plurality of nozzles for discharging a reaction gas to the process chamber. A process wafer(115) reacts with the reaction gas sprayed from the shower head. A wafer chuck(110) mounts a process wafer. A heater block(130) mounts the wafer chuck in the central part and heats the process wafer. A height adjusting part(10) controls the height of the heater block while supporting the heater block from the outside.
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