I-LINE CHEMICALLY AMPLIFIED POSITIVE PHOTOREIST FOR MICROLENS AND MICROLENS FABRICATED BY THE SAME

摘要

PURPOSE: A chemically amplified positive photoresist composition is provided to ensure excellent resolution and transmittance, to facilitate the control of curvature radius, and to secure excellent roughness of the lens. CONSTITUTION: An i-line chemically amplified positive photoresist composition for microlens comprises: (A) a resin which comprises a polymerization unit of chemical formula 1 and a polymerization unit of chemical formula 2 in a molar ration of 2:8 - 5:5, and includes a compound with 150-170°C glass transition temperature(Tg) and 9,000-11,000 average molecular weight, wherein 19.5-35 mole % of carboxylic acid group is protected with adamantyl group in the polymerization unit of chemical formula 1; (B) a photoacid generator containing a compound represented by chemical formula 3; and (C) a quencher.