APPARATUS FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus for treating a substrate is provided to remove the contamination of the substrate at the edge region of a substrate by discharging the cleaning gas over top side of the substrate. CONSTITUTION: A chamber(100) includes a process space. A processing gas injector(300) sprays the process gas. A substrate support unit(410) arranges the substrate on the processing gas injector. A gas flow control unit(400) surrounds the side of the space of the substrate and the processing gas injector. A sidewall(420) shields the side of the space between the processing gas injector and the substrate support unit. The shield sidewall of a ring shape shields the side of the space between the processing gas injector and the substrate support unit.