| 摘要 |
PURPOSE: A method and a module for cleaning a recovering chamber are provided to reduce installation space and manufacturing costs by cleaning the collection chamber with a conventional single wafer type cleansing apparatus. CONSTITUTION: A spin chuck(110) supports a substrate(W) and is rotatable. A collection chamber(120) is arranged in the circumference of the spin chuck and a nozzle assembly(130) supplying the drug solution or the pure liquid on the spin chuck. The collection chamber includes at least two drug solutions collection units(122,126). The nozzle assembly includes an upper nozzle locating on the top of the substrate and the lower nozzle locating inside the spin chuck. Clean solution is supplied from at least the upper and the lower nozzle. The supply of the clean solution and rotation of the spin chuck are performed at the same time.
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