PLASMA PROCESSING EQUIPMENT

摘要

PURPOSE: A plasma process device is provided to stably supply the power by reducing a separate distance between a reaction space of the plasma and an antenna. CONSTITUTION: A chamber body unit(200) has an atmospheric space through an opened upper side. A reaction body unit(310) is arranged on an upper side of the chamber body unit. The reaction body unit has a space connected to the atmospheric space. An upper lead(320) seals the reaction space and the atmospheric space by shielding an upper region of the reaction body unit. An antenna(800) is prepared inside the reaction body. A plasma power source(900) provides the plasma source to the antenna. The reaction body unit includes a cover forming an antenna arrangement space and a shield unit surrounding a part of the reaction space.