HEAT TREATMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A heat treatment apparatus and a substrate processing apparatus are provided to cool down a substrate after a heat treatment process by moving a return arm from a hot plate to a cool plate while the rear side of the return arm is contacted with the surface of the cool plate. CONSTITUTION: A hot plate(60) heats a substrate. A cool plate(70) cools down the substrate. A transfer apparatus(80) returns a substrate between the hot plate and the cool plate. A return arm has a plane bigger than the plane size of the substrate and transfer the substrate. The arm drive machinery(81) transfers the return arm between the hot plate and the cool plate. The rear side of the return arm is contacted with the surface of the cool plate and the substrate is cooled down through the return arm.