发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing thereof are provided to improve the quality of an image sensor by preventing a transparent electrode and a photo-diode from being exited. CONSTITUTION: A readout circuit is formed on a semiconductor substrate(100). A wiring(150) and an interlayer dielectric layer are formed on the semiconductor substrate. An image sensor unit(200) is formed on the interlayer dielectric layer and is electrically connected to the readout circuit. A transparent electrode(220) is formed on the image sensing device. A via trench passes through a transparent electrode layer and it exposes the inside of the image sensing device. A anchor plug(245) is formed inside the via trench.
申请公布号 KR20100012672(A) 申请公布日期 2010.02.08
申请号 KR20080074187 申请日期 2008.07.29
申请人 DONGBU HITEK CO., LTD. 发明人 YOON, JOON KU
分类号 H01L27/146 主分类号 H01L27/146
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