发明名称 |
LOW TEMPERATURE ADSORPTION TREATMENT AGENT FOR FLUORINE COMPOUND GAS, METHOD OF TREATING FOR FLUORINE COMPOUND GAS USING THEREOF, AND APPARATUS FOR TREATMENT OF FLUORINE COMPOUND GAS |
摘要 |
PURPOSE: A low temperature adsorption treatment agent of fluorine compound gas, a fluorine compound gas processing method using the same, and a fluorine compound gas processing device using therefor are provided to process the fluorine compound gas without additional materials. CONSTITUTION: A low temperature adsorption treatment agent of fluorine compound gas includes iron oxides, iron, alkali metal compounds, and alkaline earth metal compounds. The iron oxides or iron 100.0 includes the alkaline earth metal compound 80-2000wt pt and the alkali metal compounds 80-2000wt pt. A processing method of the fluorine compound gas includes a step for contacting the low temperature adsorption treatment agent with the fluorine compound gas in 200-800°C. |
申请公布号 |
KR20100012324(A) |
申请公布日期 |
2010.02.08 |
申请号 |
KR20080073659 |
申请日期 |
2008.07.28 |
申请人 |
KOREA INSTITUTE OF CERAMIC ENGINEERING AND TECHNOLOGY;SEMI. LINE, INC. |
发明人 |
KIM, DAE SUNG;LEE, SEUNG HO;HA, MUN SOO |
分类号 |
B01J20/04;B01D53/68;B01J20/02 |
主分类号 |
B01J20/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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