| 摘要 |
PURPOSE: A mounting table and a plasma processing apparatus using the same is provided to prevent the damage to a thermal spray foaming by using a ceramics member as a buffer material. CONSTITUTION: A main mounting unit(3) place a substrate within a process chamber performing plasma processing to a substrate. The main mounting unit includes a loader(6) in which a material(5) and the substrate are loaded. The Loader forms a groove in an edge portion. The main mounting unit is comprised of the ceramics material inserted into the groove and a thermal spray unit. The loader includes a shield ring(7). The spraying unit has an electrostatic chuck(40) which absorbs the substrate with static electricity.
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