SUBSTRATE PROCESSING EQUIPMENT AND METHOD FOR FORMING THIN FILM USING THE SAME

摘要

PURPOSE: A substrate processing apparatus and a method for forming a thin film using the same are provided to manufacture a uniform film on a substrate by rotating a substrate mounting unit and depositing a film through magnetic levitation. CONSTITUTION: A substrate(10) is mounted in a substrate mounting unit(200). The substrate mounting unit is lifted and rotated through magnetic levitation. A ground power is applied to a substrate mounting unit which is magnetically levitated. The plasma is generated on the substrate mounting unit. An oxide film etching gas is supplied and the native oxide film of the substrate is removed. The ground power is blocked, and the plasma is stopped. The supply of the oxide film etching gas is stopped. A process gas is supplied and the thin film is formed on the substrate from which the native oxide film is removed.