| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a double-sided mask which allows easy repairing, when there is a misalignment in the production of a double-sided mask, without giving damages to a top face pattern which has been preliminarily produced. <P>SOLUTION: The method for manufacturing a photomask having different patterns on the top and the back faces of a transparent substrate comprises: forming a top face pattern comprising a light-shielding film on one major surface of the transparent substrate; forming a back face alignment mark comprising a resist film on the other major surface of the transparent substrate; measuring the amount of misalignment between the top and back alignment marks; forming a light-shielding film over the entire back face of the transparent substrate; subjecting the film to a lift-off process to form a back face alignment mark; re-forming a resist film, on the whole back face of the transparent substrate; drawing a pattern, by correcting the measured misalignment amount; remeasuring the amount of misalignment between the top and back alignment marks; forming a light-shielding film on the whole back face of the transparent substrate; and subjecting the film to a lift-off process to form a back face pattern that comprises the light-shielding film. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
