发明名称 MANUFACTURING CROSS-STRUCTURES OF NANOSTRUCTURES
摘要 Techniques for manufacturing cross-structures of nanostructures, such as nanowires and carbon nanotubes are provided. In one embodiment, a method for manufacturing cross-structures of nanostructures include providing a substrate, patterning a first mask layer on the substrate, adsorbing first nanostructures onto surface regions of the substrate where the first mask layer does not exist, removing the first mask layer from the substrate, patterning a second mask layer on the substrate to which the first nanostructures are adsorbed, and adsorbing second nanostructures onto the surface regions of the substrate where the second mask layer does not exist, under conditions effective to manufacture cross-structures of nanostructures on the substrate.
申请公布号 US2010028814(A1) 申请公布日期 2010.02.04
申请号 US20080238306 申请日期 2008.09.25
申请人 SEOUL NATIONAL UNIVERSITY RESEARCH & DEVELOPMENT BUSINESS FOUNDATION ("SNU R&DB FOUNDATION") 发明人 HONG SEUNGHUN;PARK SUNG YOUNG;NAMGUNG SEON
分类号 G03F7/20;G03B27/42 主分类号 G03F7/20
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