发明名称 CHARGED PARTICLE BEAM INSPECTION METHOD AND DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a charged particle beam inspection technique capable of conducting multiple inspections using one inspection device. <P>SOLUTION: A charged particle beam inspection device 1 comprises: an electron gun 41 for irradiating a sample S with an electron beam; a detector 47 for detecting a signal from the sample S; an image processing part 61 for forming an image from the signal from the detector 47; and an energy control part 65 for controlling the beam energy of the electron beam with which the sample S is irradiated. The charged particle beam inspection device 1 conducts multiple inspections, and may be a photograph projection type inspection device. A pattern defect inspection, a foreign substance inspection, and a multi-layer defect inspection are conducted. The beam energies E1, E2, E3 in these inspections have the relationships: E1>E2; and E3>E2. Before each inspection, a vacuum chamber such as a transportation chamber 9 is neutralized. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010025788(A) 申请公布日期 2010.02.04
申请号 JP20080188214 申请日期 2008.07.22
申请人 EBARA CORP;TOSHIBA CORP 发明人 HATAKEYAMA MASAKI;OTA TAKUMI
分类号 G01N23/225;G03F1/24;G03F1/84;G03F1/86;H01J37/20;H01L21/027 主分类号 G01N23/225
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