| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition favorably usable for an application in which a front surface and a rear face of a single crystal substrate made of hexagonal silicon carbide are concurrently polished and to provide a polishing method having the same. SOLUTION: The polishing composition contains abrasive particles such as colloidal silica; salt of vanadic acid such as sodium vanadate, potassium vanadate and ammonium vanadate; hydrogen peroxide; and polyvinyl alcohol. Preferably, pH of the polishing composition is 4 to 9. COPYRIGHT: (C)2010,JPO&INPIT |
