| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning type pattern drawing device capable of carrying out exposure drawing with high accuracy and a large throughput even when the sensitivity of a photoresist is varied in many ways. <P>SOLUTION: The device is equipped with: a stage; a light modulating unit modulating the light of a light source; an irradiation unit irradiating a photosensitive material layer with the modulated light; a luminous energy adjusting unit adjusting the luminous energy of the light incident on the light modulating unit; a scanning mechanism for scanning the irradiating unit in a scanning direction relative to the stage; a control unit controlling the luminous energy adjusting unit and the scanning mechanism; a first memory unit matching and storing a plurality of exposure light quantities to be selected in accordance with the photosensitivity of a photosensitive material layer with scanning velocities suitable to the respective exposure quantities; and a second memory unit storing values of control parameters of the control unit suitable to the respective scanning velocities. The control unit selects a scanning velocity matching with the input exposure light quantity from the scanning velocities stored in the first memory unit and selects a value of control parameter suitable to the selected scanning velocity from the values of control parameters stored in the second memory unit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
